Union Optical EXAGE Wafer Defect Inspection System (IWR-200)

System 3 & 4 shown.

The Union Optical EXAGE IWR-200 Wafer Defect Inspection System has been designed to achieve an overall system performance that requires an accuracy of 0.2µm or less by making use of the world's highest level of technology.  The EXAGE system flexibly responds to the thorough and stringent inspection requirements in industry.

The EXAGE has a high degree of expandability so that the most up-to-date inspection system can be customized by utilizing a variety of optional accessories. This is an inspection system that can be upgraded depending on how it is used.

Many functions to prevent overlooking even minor defects

• Brightfield observation
• Darkfield observation
• Brightfield Polarized Light observation
• Brightfield Transmitted Light observation
• Nomarski Interference Contrast observation

Wide selection of magnification changes:   50X to 9400X

Sophisticated Software

• Windows NT®
• Various observation modes can be selected from the recipe and set electronically and instantly.
• High speed communications between the microscope and PC.
• Observational images can be transferred to optional PCs in a network.
• Defects can be promptly identified by linking them with the coordinate systems of related inspection equipment.

Shelter design to perfectly protect wafers from static electricity and contamination

• Dust-protective body shape and anti-static coating prevent dust accumulation.
• Operations to be performed on the stage, such as changing the objective, selecting the speculum, adjusting the aperture diaphragm, etc., are electrically performed so that dust falling onto a specimen can be avoided.

Operation board to prevent useless motions

• User interface to make the setting of observation modes easy.
• The software control system makes all operational modes simple, increasing the efficiency of inspection works.

The system table has been ergonomically designed so as to be operator-friendly

	Hardware			Software
	Manual Stage	Auto Stage	Wafer Transport System	Optional Equipment	Online Communication
System 1
System 2				Stage
System 3				Stage Wafer Transport System
System 4				Stage Wafer Transport System	Related Inspection System, etc.

The magnification change system and the speculum selecting system required for metallographic observations have been realized by adopting the infinity-corrected optical system. The system incorporates the plan apochromatic objectives having high-resolution, high-contrast, and long working distance, manufactured based on the fusion of the optical design and lens manufacturing technologies that Union Optical had been developing for many years. The combination of widefield eyepieces and various kinds of photographic lenses makes it possible to deal with all kinds of observation methods and the output of image information.

	Plan apochromatic objectives, and objectives of SPLIC series and Epi-SPLIC series, with high-resolution, high-contrast, and long working distance, have been installed. The system incorporates newly-designed objectives with super-high magnifications, such as 150X (NA 0.95) series and 250X (NA 0.95) series, covering the inspection works for all sorts of specimens.
	The field diameter of 26mm is secured by using the newly-designed widefield eyepiece, HUW10X.
	Intermediate magnification changers including 1.25X, 1.6X, 2.0X, and 2.5X are now available, and the observation at the maximum magnification of 9400X was made possible by combining the 250X objective lens with the 15X eyepieces.
	When CCD cameras of various sizes are used, by using 0.3X and 0.5X photographic lenses, an image having almost the same field of view as seen through the eyepieces can be observed.
	The coaxial incident-light illuminator and the transmitted light illuminator (optional) have been installed. By advancing the concept of Union Optical's unique multi-image modular system further, respective observation methods based on various systems including Brightfield, Darkfield, Polarization, Nomarski Interference Contrast, and Transmitted Light illumination (optional) systems can now be controlled by the controller in one compact area.

For further information and specifications on the EXAGE Wafer Defect Inspection System, please contact us.

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Copyright © 1998, Terran Technology, Inc.; Labtek Division
Last modified: November 06, 2012